Pulsed Plasma X-ray and EUV Sources

Main Article Content

Wong, C.S

Abstract

Recently, the development of pulsed plasma devices as X-ray and EUV sources for applications in nanolithography and microscopy has been the research topic in many laboratories around the world. In this paper, we review the research effort on three types of pulsed plasma sources being carried out in this laboratory. The devices reviewed are the plasma focus and the vacuum spark as X-ray sources; and the pulsed capillary discharge as EUV source.

Downloads

Download data is not yet available.

Article Details

How to Cite
C.S, W. (2002). Pulsed Plasma X-ray and EUV Sources. Malaysian Journal of Science, 21, 65–70. Retrieved from https://mjlis.um.edu.my/index.php/MJS/article/view/8861
Section
Original Articles