Pulsed Plasma X-ray and EUV Sources

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Published: Dec 26, 2002

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Wong, C.S

Abstract

Recently, the development of pulsed plasma devices as X-ray and EUV sources for applications in nanolithography and microscopy has been the research topic in many laboratories around the world. In this paper, we review the research effort on three types of pulsed plasma sources being carried out in this laboratory. The devices reviewed are the plasma focus and the vacuum spark as X-ray sources; and the pulsed capillary discharge as EUV source.

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How to Cite
C.S, W. (2002). Pulsed Plasma X-ray and EUV Sources. Malaysian Journal of Science, 21, 65–70. Retrieved from https://mjlis.um.edu.my/index.php/MJS/article/view/8861
Issue
Vol. 21 (2002): Special Issue for the International Conference on X-rays & related Techniques in Research & Industry (ICXRI- 2002)
Section
Original Articles

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